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SFB 591 » Projekte » B7
 

Title

Cluster-deposition from inductively coupled plasmas

Project manager

Prof. Dr. Achim von Keudell
Institut für Experimentalphysik II
Anwendungsorientierte Plasmaphysik
Ruhr-Universität Bochum

Prof. Dr. Peter Awakowicz
Lehrstuhl für Allgemeine Elektrotechnik und Plasmatechnik
Ruhr-Universität Bochum

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  Summary
  Goals
Nanometer-sized particles have a great potential for many applications since they can lead to novel materials such as hard nano-composites or amorphous thin film electronics with low degradation. An efficient way to produce nano-meter sized particles is the use of a reactive plasmas, where particulates are often inherently formed. The control of the particle size is very often performed empirically by pulsing the plasma. A much better control of the particle size can be achieved by exploiting the feedback between particle appearance and the characteristics of the discharge. A promising possibility of such a feedback mechanism is the particle induced E-H transition in inductively coupled plasmas. This transition of the heating mode of a glow discharge from a capacitive coupling (E) to an inductive coupling (H) occurs for a given power at a certain conductivity of the discharge. This conductivity is dominated by the electron density as well as by the electron energy distribution function (EEDF). The influence of the appearance of particles on these two quantities is two-fold. First, particles in the discharge act as a sink for electrons and reduce mainly the electron density. Second, low energy electrons are preferably attached to very small particles (< 2nm) and deplete the low energy part of the electron distribution function. At the same time the high energy part of the electron distribution function is more efficiently heated. As a consequence the EEDF is significantly changed due to the appearance of particles. This feedback mechanism between the appearance of particles and the change in the discharge characteristics is investigated in this project.
 
 
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